(2000):

ABSTRACT:
Classical optical lithography is diffraction limited to writing features
of a size lambda/2 or greater, where lambda is the optical wavelength.
Using nonclassical photon-number states, entangled N at a time, we show
that it is possible to write features of minimum size lambda/(2N) in an
N-photon absorbing substrate. This result allows one to write a factor of
N^{2} more elements on a semiconductor chip. A factor of N = 2
can be achieved easily with entangled photon pairs generated from
optical parametric down-conversion. It is shown how to write arbitrary
2D patterns by using this method.